Anode Layer Linear Ion Source for Roll-to-Roll Process from 300 mm to 1550 mm

Roll-to-roll (RTR) process requires a linear surface treatment source in various processes such as pre-treatment, etching, and deposition. For high speed and large width processes the linear source should have superior characteristics that can be applied to 100~300 m/mim process and large width treatment up to 2 m. Several linear surface treatment sources have been proposed to the RTR process. For example, a dual magnetron sputtering (DMS) plasma enhanced chemical vapor deposition (PECVD) and a linear deposition source using a magnetic layer linear ion source have been introduced recently [1,2]. These sources showed outstanding performances for deposition methods. In pre-treatment and etching parts a RF plasma source, a glow discharge and a linear ion source have been used widely. Especially the linear ion source has been applied to the surface pretreatments from polymer to steel. There are two types of the linear ion source, a magnetic layer and an anode layer ion source. The magnetic layer source is convenient to generate plasma with low energy electrons for PECVD applications as mention above. In contrast, the anode layer linear ion source (ALIS) can emit high energy ion beams uniformly up to 2 m. The robust structure and reliable ion beam extraction are other attractive characteristics of the ALIS in RTR process.